Thursday, September 27, 2018 10:00 am
Central Daylight Time (Chicago, GMT-05:00) Change time zone
Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) is a powerful analytical technique with submicron spatial resolution, ppm sensitivity, and the ability to detect both elemental and molecular species on surfaces. One limitation of TOF-SIMS is that spectra are often difficult to interpret, especially for real-world industrial samples that have a complex mixture of chemicals on the surface. The TOF-SIMS spectrum contains the fragmentation pattern of all the different molecular species on the surface added together. The recent development of parallel imaging MS/MS has greatly simplified the interpretation of TOF-SIMS spectra. By selecting a single precursor ion from the complex TOF-SIMS spectrum and fragmenting it by collision induced dissociation (CID), the clean and unique fragmentation pattern makes identification easy. Several industrial applications will be discussed that demonstrate how MS/MS greatly extends the analytical capability of the TOF-SIMS technique.