Technologies

High-Resolution Maskless Direct Imager for R&D & Prototyping

• Maskless Direct Imaging: Write high-resolution microstructures in i-line resists without requiring photomasks.
• Ultra-High-Speed Exposure: 100 x 100 mm² exposure in just 9 minutes.
• Exceptional Resolution & Accuracy:
  • Minimum feature size: 500 nm
  • Edge roughness: < 40 nm
  • CD uniformity: < 60 nm
  • Alignment accuracy: Topside: 100 nm | Backside VIS/IR: ±1 µm
• Advanced Calibration & Autofocus:
  • Real-time optical & pneumatic autofocus with 80 µm dynamic compensation.
  • Integrated metrology functions for positioning, CD uniformity, and edge roughness monitoring.
• Multi-Mode Write System: Choose from two write modes:
  • High NA Mode: Maximum resolution for ultra-fine microstructures.
  • Lower NA Mode: Optimized for throughput and depth-of-focus (DOF) critical applications.
• Scalable & Flexible:
  • Maximum exposure area: 300 x 300 mm².
  • Compatible with wafers up to 300 mm in size.

Compact Maskless Lithography System for High-Precision Microstructuring

• High-Resolution Maskless Lithography: No mask required—direct-write exposure ensures efficient and cost-effective fabrication.
• Flexible Exposure Modes:
  • Raster Scan Mode: Consistent high-speed writing regardless of pattern density.
  • Vector Scan Mode: Ideal for curved structures, delivering smooth, continuous lines.
• Compact & Small Footprint: 25″ x 33″ x 21″ (640 mm x 840 mm x 530 mm) – fits on a standard lab workbench.
• Fast Exposure Speeds: A 4″ wafer can be exposed in just 90 minutes.
• Advanced Optical Configurations: Min. resolution of 0.6 µm, 1 µm, and 3 µm, with variable resolution options.
• High-Precision Alignment:
  • Edge roughness: Raster mode: 100 nm, Vector mode: 30 nm
  • CD uniformity: 200 nm
• Upgradable Exposure Area: Expand from 100 x 100 mm² to 150 x 150 mm².
• Glovebox Integration: Compatible for patterning sensitive materials in controlled environments.

Precision Thin-Film Deposition with Low Thermal Load and Multi-Material Co-Evaporation

• Contact Metallization in Microelectronics
• Lift-Off Processes in Nanofabrication
• Thin-Film Deposition of High-Purity Metals
• Research & Development in Surface Science
• UHV Coating Systems for Sensors, MEMS, and Semiconductors

High Shear Liquid Homogenizer for lipid nanoparticle preparation (up to 60,000 psi)

UltraGenizer is a laboratory ultra high pressure processing device. It is an electrically-driven and bench-top high shear homogenizer, which requires no compressed air or hydraulic oil to achieve maximum 4,200 bar (60,000 psi) operating pressure.

• Efficient – More uniform particle size distribution
• Flexible – Flow range: 12~35 L/hr, suitable for medium-scale production Continuous
• Stable – Working pressure up to 60,000 psi ensures stable homogenization
• Intelligent – PLC real-time monitoring of flow, temperature, and pressure
• Safe – Hygienic stainless steel and pharmaceutical-grade surface treatment
• Economical – Affordable price for genuine microfluidics technology
• Quiet – Operating noise below 60 dB does not affect personnel

Pressure:

Flow Rate:

Chamber:

Syringe Inlet&Outlet:

Option: Inlet Stainless Cylinder:

Option: Heat Exchanger:

Voltage:

Warranty:

Compliance:

• Portable hand driven homogenizer for concept testing up to 30,000 psi.
• Low-cost high pressure homogenizer
• Portable design delivers the light weight and small dimensions
• Convenient hand operation without the need for compressed gas
• A better choice for small-scale formulation screening
• An alternative to the high pressure homogenizers driven by compressed air

Introducing M.A.T. by 3DCeram, a groundbreaking ceramics printing technology in Canada. It extends 3D printing to advanced ceramics with precise control and versatile material compatibility. Enjoy efficiency, precision, and ease of use. M.A.T. also offers CNC machining and robocasting for post-processing. Ideal for Canadian researchers, M.A.T. combines two leading 3D extrusion technologies for prototype development and complex ceramics.

• Extra-wide measuring range, individually adjustable
• Variable measuring time – below 5 minutes
• High-performance camera with telecentric lenses
• Fast, simple operation via SOP control
• High-performance, integrated image analysis software ISS
• Extensive library for morphological analysis
• Useful tools for reliable quality monitoring
• Practical report generator for individual presentation of results
• Meets the requirements of ISO 13322-2 for Dynamic Image Analysis

With the use of the Eyecon2 – Direct Imaging Particle Analyzer, clients may better comprehend particle size and shape variation, which allows them to ascertain why a process is failing, why yield is decreasing, the cause of product variation, and if or how a process should be scaled up for commercial manufacture.

Eyecon2 has reduced cycle time and increased yields due to its use of Fluidised Bed Coating (e.g. Wurster), fluidised bed Granulation/Drying, Twin Screw Granulation, Dry Granamination/Roller Compaction, Extrusion Spheronisation, Milling, Blending, and product transfer process equipment. It uses direct imaging processed in real-time, with ellipses fitted to each particle’s boundary, shape and size reported back, highlighting variations. Continuous monitoring of processes critical quality attributes (CQAs) can be used to devise a data-driven control strategy, and non-product contact is used to ensure proper measurements every time.

• Renishaw’s inVia Raman microscope can incorporate fluorescence lifetime imaging microscopy (FLIM) to study material structure and composition.
• FLIM integrated with the inVia Raman microscope enables the creation of spatial images that represent the fluorescence lifetime.
• FLIM images can be correlated pixel by pixel with corresponding Raman images on the same coordinate system, allowing for direct correlation.
• FLIM imaging is faster than Raman imaging, making it useful for identifying regions of interest for subsequent Raman measurements.
• FLIM has applications in cell biology research, environmental sensing, monitoring molecular interactions, and identifying specific fluorophores.