Technologies

Pico-Glide™ is a coating agent designed for users who manufacture their own microfluidic biochips using plasma etched glass or PDMS.

– A reliable, high-performing surfactant for droplet microfluidics

• Biocompatibility– designed for generating aqueous picodroplets in oil
• Highest droplet stability– shown by assessment of picodroplet fusion, interfacial tension and critical micelle concentration
• Stability at high temperature– demonstrated by the low level of picodroplet fusion
• Low voltage for droplet sorting– purity and quality of the surfactants enables a more efficient sorting process
• Excellent batch-to-batch reproducibility– all products undergo rigorous QC and QA testing to ensure batch consistency
• Unique and patented molecular surfactant structure – patent freedom to operate in a wide range of application areas.
• Specialist expertise and support– our team brings extensive experience and support to guide your applications

Theta Flex Auto 2 package with automatic double dispensing, droplet placement and horizontal sample movement. Automatic surface tension, contact angle and surface free energy. Includes Theta Flex frame with a high resolution / high speed camera, optics with zoom and focus, automatic x-direction sample stage, automatic dispenser holder for single/double dispenser, 2 automatic pipette tip dispensers and all-inclusive OneAttension software (TF300 + T320 + T302 + 2 x C311-300).

For testing the quality and processability of those materials, the single-screw laboratory extruder 19/25 QC is a proven tool. With over 35 years of expertise, we have developed a wide variety of different screw designs that are guaranteed to provide the best performance.

Typical applications for single-screw extruders are as follow:

• Testing melting behavior
• Testing individual and combined influences of additives (stabilizer, lubricant) and functional additives (antioxidation, UV-stabilizers, pigments and fillers)
• Processability of newly developed materials
• Manufacturing homogeneous melts
• Manufacturing films, foils, strands and profiles for optical and mechanical testing as well as outdoor exposure tests
• Measuring rheological behaviour (viscosity, elasticity)
• Foam extrusion
• Extrusion of PVC compounds
• Blown films
• Cast films and sheet
• Extrusion of ceramic materials or PIM-compounds
• Rheological testing with special dies

• Substrate size: from 5 mm to 5”
• Minimum feature size: down to 0.6 µm
• Maximum write speed (at 4 µm resolution): 200 mm²/min
• Real-time autofocus system
• Frontside alignment
• Easy-to-use operating software
• 2 available optical setups
• Choice of exposure Module: Raster and/or Vector scan
• Variable resolution
• Draw Mode
• Wavelengths (Raster Scan): 390 nm or 365 nm exposure wavelength
• Wavelengths (Vector Scan): 405 nm and/or 375 nm
• Overview camera for alignment and inspection

• Minimum substrate size: 3 mm x 3 mm
• Maximum exposure area: 6” x 6” (optional 8”x 8”)
• Minimum structure size down to 0.6 μm
• Maximum write speed: 1400 mm²/min at 1 μm feature size
• Real-time autofocus
• Overview camera for fast alignment and inspection
• Front- and backside alignment
• Temperature-controlled environmental chamber
• Exposure wavelengths: 405 nm and / or 375 nm
• Draw Mode for CAD-less exposure
• Standard Grayscale Exposure Mode
• High-Aspect Ratio Mode
• Easy-to-use operating software

• Maximum exposure area: 300 mm x 300 mm
• Minimum feature size: 1.5 μm
• Minimum lines and spaces: 2 µm
• Maximum write speed: 5000 mm²/min (at 405 nm, with one module)
• Real-time autofocus
• Overview camera for fast alignment and inspection
• Front- and backside alignment
• Temperature-controlled environmental chamber
• Exposure wavelengths: 405 nm and / or 375 nm

• Maximum exposure area: 200 x 200 mm²
• Maximum substrate size: 9″ x 9″
• Multiple Write Modes
• Minimum feature size: down to 300 nm
• Maximum write speed (at 4 µm feature size): 2000 mm²/min
• Address grid down to 5 nm
• Grayscale exposure mode with up to 1000 gray levels
• Vector and Raster scan exposure mode
• Multiple data input formats
• Front- and backside alignment
• Climate chamber
• Two choices of laser wavelength (405 nm or 375 nm)
• Real-time autofocus system
• Scripting capability
• Integrated camera system for measurement and inspection

• Maximum exposure area: up to 400 x 400 mm²
• Maximum substrate size: 17″ x 17″
• Professional Grayscale Mode
• Multiple Write Modes
• Minimum feature size down to 0.5 µm
• Maximum exposure speed (at 1.3 µm feature size): 370 mm²/ minute
• Address grid down to 5 nm
• Modular configuration concept to fit customer application
• Realtime autofocus
• Stage map correction
• Camera system for measurement and inspection
• Automatic loading system
• Customer specific laser
• Multiple data input formats (DXF, CIF, GDSII, Gerber, STL, BMP)

TABLETOP DIRECT WRITE NANOLITHOGRAPHY & AFM

• Detection of features buried under resist.
• Fast exchange and calibration
• Integrated topography sensor
• Entry-level nanopatterning system with many unique capabilities
• Thermal probe lithography is the fastest of all scanning probe lithography methods
• Direct resist removal and in-situ inspection enable fast turnaround times.
• Well-suited for academic research groups as a simple tool to easily create their own high-quality nanopatterns and devices

Revolutionizing Nanofabrication

INDUSTRIAL-GRADE THERMAL SCANNING PROBE LITHOGRAPHY TOOL WITH MULTI-TIP WRITE HEAD

• High-resolution
• Thermal Scanning Probe Lithography
• Non-invasive Lithography
• Precise Overlay and Stitching
• Unique Thermal Cantilevers
• IDecapede Module
• Laser Sublimation Module
• Vibration Isolation
• Low Cost of Ownership
• Compatibility with all standard pattern transfer methods: lift-off, etching, nanoimprint lithography
• In-situ Imaging immediate control of patterned structures

• Filament Extruder X 1EA
• Hot-Melting Pneumatic Dispense X 1EA
• -4-60°C (cooling/heating)
• Ultrasonic Sensor + 1OOTPI Fine Adjust Screw I Fork Sensor
• 720p HD Camera
• C02 Incubator (C02 5%, 37°C, Humidity 80%)
• Syringe Pneumatic Dispense X 5EA + NFC Tagging System 1EA

The freedom to develop your own process

• Dedicated to R&D development, the C100 LAB opens opportunities to​
• Develop materials with a low quantity of material
• Qualify design
• Print parts to show case
• User friendly
• Open parameters
• Stereolithography laser
• Free link support technology
• Controlled quantity of printed ceramic slurry
• Accessible for persons with reduced mobility
• Start a printing run with only 60 mL of ceramic formulation
• Cartridge of 180 mL, 360 mL, 600 mL or 920 mL available)
• Option : Pressure tank (1,5 L)