Nano-lithography Systems

High-Resolution, Modular Nanolithography Tool for Advanced Research

• High-Resolution Nanopatterning: 15 nm lateral features, <2 nm vertical resolution.
• Markerless Overlay & Stitching: 25 nm alignment accuracy without markers.
• Damage-Free Lithography: No charged particles or proximity effects, ensuring clean lift-off and etching compatibility.
• Hybrid t-SPL & DLS Lithography: Fast large-area patterning with laser sublimation (DLS) and high-resolution nanoscale writing with t-SPL.
• Parallel Writing with Decapede Module: 10 cantilevers for increased throughput while maintaining high resolution.
• Automated Workflow & Scripting: Python-based automation, real-time imaging, and closed-loop corrections.
• Versatile Process Compatibility: Works with standard pattern transfer methods, including lift-off, etching, and molding.