This fall SwissLitho is releasing its newest product “NanoFrazor Explore DLS“. This unique hybrid nano-micro lithography system, which combines thermal Scanning Probe Lithography (tSPL) with Direct Laser Sublimation (DLS) was developed by Heidelberg Instruments and SwissLitho.
SwissLitho commercialized tSPL out of IBM Research in 2014 and its commercial NanoFrazor systems are installed at various institutions and used for the fabrication of nanodevices when usual nanolithography techniques get complicated or fail.
You are cordially invited to this workshop which aims to introduce the capabilities of the technologies of Heidelberg Instruments and SwissLitho and discuss their opportunities for McGill University researchers.
Date and time: 1:30 pm, Sept 17th, 2019
Place/Room: Rutherford Physics building, RM 105, 3600 University street
| Program: | ||
| 1:30 pm | NanoFrazor lithography – an overview | |
| 1:55 pm |
NanoFrazor DLS – mix&match lithography in the same resist and same system | |
| 2:20 pm |
Overview on various pattern transfer processes for NanoFrazor lithography | |
| 2:45-3:00 pm |
Open user discussion | |
| 3:00-5:00 pm |
Live System demo in CR |
We are looking forward to seeing you at our workshop!
For more information please contact : Serge Dandache
