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Spectroscopy

Spectroscopy involves analysis of the interaction between matter and any portion of the electromagnetic spectrum. We carry instruments including light sources (lasers) and spectrometers for producing and measuring light over a wide wavelength range.

Below is a list of partners we work with in this field:

Headwall
NKT Photonics
WITec
Advantest
Tornado Spectral

Showing 1–16 of 36 results


    • Scanned, micro-focused, monochromatic x-ray beam
    • X-ray beam induced secondary electron imaging
    • Dual beam charge neutralization
    • Large area XPS
    • Micro-area XPS
    • Chemical state imaging with 128 data channels
    • Sputter depth profiling
    • Floating column argon ion gun
    • Compucentric Zalar rotation
    • Angle dependent XPS
    • Five axis automated sample manipulator
    • 25 mm and 60 mm diameter sample holders

     

  • Spectrometers for Spectral Domain Optical Coherence Tomography (SD-OCT)

    • High Efficiency
    • USB3 Vision Compatibility
    • High Resolution
    • Customizable center wavelength and spectral range

     

  • The MLA150 has been specifically designed for easy operation and includes all our know-how on developing maskless lithography systems that we have gathered in the past 30 years. It offers all the capabilities that are required for single layer and multi-layer applications and because the MLA150 exposures are always non-contact it will even overcome some of the limitations of photomask based exposure technologies.

     

  • The MLA100 is the perfect lithography solution for many R&D applications. The optical system is designed to write structures down to 1 μm at a speed of 50 mm²/min directly into photoresist, without the need for a photomask. The elimination of photomasks from the lithographic process will increase the flexibility and significantly shorten the prototyping or manufacturing cycle.

     

  • Setting a new standard for nanoscale IR spectroscopy and imaging

    • One Platform for the highest IR spectral and spatial resolution
    • Two complementary nanoscale IR techniques: s-SNOM; and AFM-IR
    • Multiple nanoscale property mapping modes with full featured AFM
    • “Anasys engineered” for productivity and reliability
  • Lithography systems can accommodate substrates of arbitrary shapes with lateral dimensions of up to 1400 x 1400 mm2

  • Deep UV lithography systems with a 244 nm laser source, which can expose these resists and write isolated structures down to 200 nm and lines and spaces with a period of 500 nm. Other DUV light sources are available on demand.

     

    • Applications for implementation of electronic systems
    • Non-planar surfaces
    • Imaging sensors
    • Artificial vision
    • Integrated micro-optics
  • This module (comprising controller, software and probes) enables most AFMs to be able to do temperature mapping of their sample with 0.1ºC resolution.

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  • This resolution is 100x better than previously reported and is made possible by our thermal probe technology which enables you to:
    • Image the sample of interest with sub-30nm spatial resolution (in contact or intermittent contact modes) and identify the regions whose thermal properties that you’d like to study.
    • Heat a local area of less than 100nm diameter with the probe to temperatures of over 400˚C to study thermal properties such as glass transition or melting point.
    • Local heating allows very fast heating rates up to 600,000˚ C/min and eliminates thermal drift issues that plague bulk sample heating approaches.
    • Image with a heated tip to induce local thermal events over specific regions of a surface.
    • Map the temperatures across the sample with a resolution of <0.1 ºC

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  • Full featured AFM

    • All common imaging modes
    • High resolution closed loop imaging with excellent noise performance

    Easy to setup and operation

    • The afm+ is built for maximum ease of use; premounted cantilevers allow fast and easy alignment
    • Motorized sample stage and high quality optics allow rapid location of the analysis area
    • Decades of AFM expertise distilled into instrument design means faster time to results, even for novice users

    Powerful localized nanoscale analytical techniques pioneered by Anasys world leading scientific team

    • Thermal: nanoscale thermal analysis with our patented ThermaLever probes
    • Mechanical: wideband nanomechanical analysis with our Lorentz Contact Resonance mode
    • Chemistry: upgradeable to add nanoscale IR Spectroscopy for localized chemical composition
  • nanoIR2TM with top side illumination | AFM+ IR Spectroscopy | AFM+ Thermal Analysis

    • Expands nanoscale IR to a broad range of real world samples
    • New resonance enhanced mode enables nanoscale IR on <20nm films
    • Rich, interpretable IR spectra
    • Powerful, full featured AFM
    • Multifunctional measurements including integrated thermal and mechanical property mapping
    • Designed and built for productivity and rapid time-to-results

     

     

     

  • The complete nanoscale IR spectroscopy solution for all your material analysis needs. The nanoIR2-s, the only platform that offers:

    • AFM-IR for soft materials, including organics, polymers, composites and life sciencesdownload_1
    • s-SNOM for hard materials including inorganics, semiconductors, nanoantennas, graphene and other 2D materials
    • True, model-free spectroscopic chemical analysis with AFM-IR – not ambiguous material mapping
    • Sub 20-nm spatial resolution mapping of complex optical properties and light-matter interactions (e.g. plasmon/phonon-polaritons)
    • Proven ease of use and productivity on real world samples • Powerful, full-featured AFM with standard imaging modes

    Anasys-nanoIR2-s-Brochure

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    • 4.9 cm-1 spectral resolution with no slit
    • Standard and deep-cooled detector options
    • Configurable across NIR/VIS
    • Detects weak signals quickly
    • No moving parts

     


Showing 1–16 of 36 results

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