Spectroscopy involves analysis of the interaction between matter and any portion of the electromagnetic spectrum. We carry instruments including light sources (lasers) and spectrometers for producing and measuring light over a wide wavelength range.

Below is a list of partners we work with in this field:

NKT Photonics
Tornado Spectral

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    • Scanned, micro-focused, monochromatic x-ray beam
    • X-ray beam induced secondary electron imaging
    • Dual beam charge neutralization
    • Large area XPS
    • Micro-area XPS
    • Chemical state imaging with 128 data channels
    • Sputter depth profiling
    • Floating column argon ion gun
    • Compucentric Zalar rotation
    • Angle dependent XPS
    • Five axis automated sample manipulator
    • 25 mm and 60 mm diameter sample holders


  • Spectrometers for Spectral Domain Optical Coherence Tomography (SD-OCT)

    • High Efficiency
    • USB3 Vision Compatibility
    • High Resolution
    • Customizable center wavelength and spectral range


  • The MLA150 has been specifically designed for easy operation and includes all our know-how on developing maskless lithography systems that we have gathered in the past 30 years. It offers all the capabilities that are required for single layer and multi-layer applications and because the MLA150 exposures are always non-contact it will even overcome some of the limitations of photomask based exposure technologies.


  • The MLA100 is the perfect lithography solution for many R&D applications. The optical system is designed to write structures down to 1 μm at a speed of 50 mm²/min directly into photoresist, without the need for a photomask. The elimination of photomasks from the lithographic process will increase the flexibility and significantly shorten the prototyping or manufacturing cycle.


  • Setting a new standard for nanoscale IR spectroscopy and imaging

    • One Platform for the highest IR spectral and spatial resolution
    • Two complementary nanoscale IR techniques: s-SNOM; and AFM-IR
    • Multiple nanoscale property mapping modes with full featured AFM
    • “Anasys engineered” for productivity and reliability
  • Lithography systems can accommodate substrates of arbitrary shapes with lateral dimensions of up to 1400 x 1400 mm2

  • Deep UV lithography systems with a 244 nm laser source, which can expose these resists and write isolated structures down to 200 nm and lines and spaces with a period of 500 nm. Other DUV light sources are available on demand.


    • Applications for implementation of electronic systems
    • Non-planar surfaces
    • Imaging sensors
    • Artificial vision
    • Integrated micro-optics
  • This module (comprising controller, software and probes) enables most AFMs to be able to do temperature mapping of their sample with 0.1ºC resolution.


  • This resolution is 100x better than previously reported and is made possible by our thermal probe technology which enables you to:
    • Image the sample of interest with sub-30nm spatial resolution (in contact or intermittent contact modes) and identify the regions whose thermal properties that you’d like to study.
    • Heat a local area of less than 100nm diameter with the probe to temperatures of over 400˚C to study thermal properties such as glass transition or melting point.
    • Local heating allows very fast heating rates up to 600,000˚ C/min and eliminates thermal drift issues that plague bulk sample heating approaches.
    • Image with a heated tip to induce local thermal events over specific regions of a surface.
    • Map the temperatures across the sample with a resolution of <0.1 ºC



  • Full featured AFM

    • All common imaging modes
    • High resolution closed loop imaging with excellent noise performance

    Easy to setup and operation

    • The afm+ is built for maximum ease of use; premounted cantilevers allow fast and easy alignment
    • Motorized sample stage and high quality optics allow rapid location of the analysis area
    • Decades of AFM expertise distilled into instrument design means faster time to results, even for novice users

    Powerful localized nanoscale analytical techniques pioneered by Anasys world leading scientific team

    • Thermal: nanoscale thermal analysis with our patented ThermaLever probes
    • Mechanical: wideband nanomechanical analysis with our Lorentz Contact Resonance mode
    • Chemistry: upgradeable to add nanoscale IR Spectroscopy for localized chemical composition
  • nanoIR2TM with top side illumination | AFM+ IR Spectroscopy | AFM+ Thermal Analysis

    • Expands nanoscale IR to a broad range of real world samples
    • New resonance enhanced mode enables nanoscale IR on <20nm films
    • Rich, interpretable IR spectra
    • Powerful, full featured AFM
    • Multifunctional measurements including integrated thermal and mechanical property mapping
    • Designed and built for productivity and rapid time-to-results




  • The complete nanoscale IR spectroscopy solution for all your material analysis needs. The nanoIR2-s, the only platform that offers:

    • AFM-IR for soft materials, including organics, polymers, composites and life sciencesdownload_1
    • s-SNOM for hard materials including inorganics, semiconductors, nanoantennas, graphene and other 2D materials
    • True, model-free spectroscopic chemical analysis with AFM-IR – not ambiguous material mapping
    • Sub 20-nm spatial resolution mapping of complex optical properties and light-matter interactions (e.g. plasmon/phonon-polaritons)
    • Proven ease of use and productivity on real world samples • Powerful, full-featured AFM with standard imaging modes




    • 4.9 cm-1 spectral resolution with no slit
    • Standard and deep-cooled detector options
    • Configurable across NIR/VIS
    • Detects weak signals quickly
    • No moving parts


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