Nano-lithography Systems

TABLETOP DIRECT WRITE NANOLITHOGRAPHY & AFM

• Detection of features buried under resist.
• Fast exchange and calibration
• Integrated topography sensor
• Entry-level nanopatterning system with many unique capabilities
• Thermal probe lithography is the fastest of all scanning probe lithography methods
• Direct resist removal and in-situ inspection enable fast turnaround times.
• Well-suited for academic research groups as a simple tool to easily create their own high-quality nanopatterns and devices

Revolutionizing Nanofabrication

INDUSTRIAL-GRADE THERMAL SCANNING PROBE LITHOGRAPHY TOOL WITH MULTI-TIP WRITE HEAD

• High-resolution
• Thermal Scanning Probe Lithography
• Non-invasive Lithography
• Precise Overlay and Stitching
• Unique Thermal Cantilevers
• IDecapede Module
• Laser Sublimation Module
• Vibration Isolation
• Low Cost of Ownership
• Compatibility with all standard pattern transfer methods: lift-off, etching, nanoimprint lithography
• In-situ Imaging immediate control of patterned structures