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Nanolithography

Nanolithography is the branch of nanotechnology concerned with the study and application of fabricating nanometer-scale structures, meaning patterns with at least one lateral dimension between 1 and 100 nm. Different approaches can be categorized in serial or parallel, mask or maskless/direct-write, top-down or bottom-up, beam or tip-based, resist-based or resist-less methods. Below is partner we work with in this field:


 Heidelberg

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    • High-quality production of 3D templates
    • Small areas in high resolution in 2D or 3D, with Mix-and-Match
    • 3D photolithography mask writing (with in-situ metrology without the need for optical proximity corrections)
    • Novel nanodevices that require individually customized parts

     

    • Thermal Scanning Probe cantilevers with ultra-sharp tips
    • 3D nanolithography
    • In-situ metrology with sub-nm resolution for overlay, stitching & closed-loop lithography
    • Real-time, automatic tuning of patterning parameters
    • Short overall fabrication time, no resist development needed
    • Stand-alone unit with low requirements on infrastructure (no vacuum or high voltages required)
    • High degree of customization and automatization
    • Ideal for small workpieces up to a size of 4-inch
    • Compatibility with various transfer processes and materials
    • Exchange and calibration of cantilevers within one minute

     

  • The MLA150 has been specifically designed for easy operation and includes all our know-how on developing maskless lithography systems that we have gathered in the past 30 years. It offers all the capabilities that are required for single layer and multi-layer applications and because the MLA150 exposures are always non-contact it will even overcome some of the limitations of photomask based exposure technologies.

     

  • The MLA100 is the perfect lithography solution for many R&D applications. The optical system is designed to write structures down to 1 μm at a speed of 50 mm²/min directly into photoresist, without the need for a photomask. The elimination of photomasks from the lithographic process will increase the flexibility and significantly shorten the prototyping or manufacturing cycle.

     

  • Setting a new standard for nanoscale IR spectroscopy and imaging

    • One Platform for the highest IR spectral and spatial resolution
    • Two complementary nanoscale IR techniques: s-SNOM; and AFM-IR
    • Multiple nanoscale property mapping modes with full featured AFM
    • “Anasys engineered” for productivity and reliability
  • Lithography systems can accommodate substrates of arbitrary shapes with lateral dimensions of up to 1400 x 1400 mm2

  • Deep UV lithography systems with a 244 nm laser source, which can expose these resists and write isolated structures down to 200 nm and lines and spaces with a period of 500 nm. Other DUV light sources are available on demand.

     

    • Applications for implementation of electronic systems
    • Non-planar surfaces
    • Imaging sensors
    • Artificial vision
    • Integrated micro-optics
    • Substrates up to 200 x 200 mm²
    • Structures down to 0.6 µm
    • Address grid down to 10 nm
    • Multiple write modes
    • Vector and Raster exposure mode
    • Multiple data input formats

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Contact Spectra Research

Address

5805 Kennedy Rd
L4Z 2G3 Mississauga
Ontario
Canada

Phone :  905-890-0555

Toll Free : 1-866-753-4433
Fax :  905-890-1959

 

About Spectra Research

Spectra Research Corporation (SRC) offers a range of innovative high-quality scientific products and laboratory services to industrial and scientific markets throughout Canada.

Established in 1993, SRC is a subsidiary of Allan Crawford Associates (ACA), one of Canada’s largest distributors of electronic components, test equipment and integrated networking solutions.

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