Features of the VersaProbe III:

• New Analyzer input lens with 2-3 times higher sensitivity for all analysis conditions
• New Multi-channel detector for faster elemental and chemical imaging
• New Angle dependent technology for +/- 5 degree solid angle collection for ADXPS measurements
• Improved Hot/cold stage providing temperatures of -140° C to +600° C
• New Dedicated hot sample platen operating up to 800° C
• New 4-contact transferable sample mount for in-situ controlled potential experiments
• New UPS design for increased sensitivity and improved energy resolution
• Improved Auger performance providing higher energy resolution and better signal to noise

• Micro-Focused Scanning X-ray Source
• Large Area Spectroscopy
• Micro Area Spectroscopy
• Sputter Depth Profiling
• Multi-Technique Test Chamber
• SmartSoft-VersaProbe
• MultiPak Data Reduction Software
• Features & Accessories

• Micro-focused, raster scanned x-ray beam
• X-ray beam induced secondary electron imaging
• XPS images with spectra at each pixel for retrospective chemical analysis
• Point or multi-point spectroscopy
• Point or multi-point thin film analysis

Turnkey Auto Analysis

• Point and click analysis area definition
• Robust Auto-Z sample alignment at all spot sizes
• No-tune dual beam charge neutralization
• Move without concern from insulator to conductor in auto analysis sequences

Superior Micro Area Performance

Optimized Configuration

• Micro-focused x-ray beam
• High sensitivity spectrometer
• High performance floating column argon ion gun
• Turnkey dual beam charge neutralization
• Compucentric Zalar Rotation™
• Micro-area sputter depth profiling
• Multi-point sputter depth profiling

Inorganic Sputter Depth Profiling

• High performance 0-5 keV Ar⁺ion gun
• Low voltage floating column for ultra thin film sputter depth profiling
• Bend in ion column to stop neutrals

Organic Sputter Depth Profiling

• Optional 10 and 20 kV C₆₀ion guns
• Optional 20 kV Ar₂₅₀₀⁺gas cluster ion gun
• Mass filtered cluster ion sources
• Bend in ion column to stop neutrals

2 keV sputter depth profile of a multi-layer PVD TiC/C coating on silicon performed using Zalar rotation to enhance layer definition.

2 keV sputter depth profile of a multi-layer coating on a computer hard disk performed using Zalar rotation to enhance layer definition.

10 kV C_60⁺ sputter depth profile of 3 nm Irganox 3114 layers in an Irganox 3110 film.

20 kV Ar₂₅₀₀⁺ sputter depth profile of a 10 µm thick multilayer polymer film showing expected composition and layer definition.

 SmartSoft

Whether you are a casual user or an expert, the work flow driven UI and enhanced feature set will increase your productivity.

• Intuitive single window user interface
• Session tabs guide you through the analysis process
• Integrated sample platen management
• Point and click analysis area definition on saved images
• User friendly queuing of multiple analysis tasks
• Multi-point analysis and sputter depth profiling within an imaged area
• Fully integrated control of optional accessories

 Data Reduction for XPS and AES

PHI MultiPak is the most comprehensive data reduction and interpretation software package available for electron spectroscopy. The tasks of spectral peak identification, extracting chemical state information, quantification, and detection limit enhancement are addressed with an array of powerful and easy-to-use software tools for spectra, line scans, images and sputter depth profiles. MultiPak can be used on the instrument PC to process data in real time or on an off line PC for report generation.

Advanced Data Reduction Tools

• Auto peak identification
• XPS chemical state database
• XPS spectral deconvolution
• Quantitative analysis
• Non-linear least squares fitting
• Linear least squares fitting
• Target factor analysis
• Retrospective chemical imaging
• Batch mode data processing

 Standard Features

• Scanned, micro-focused, monochromatic x-ray beam
• X-ray beam induced secondary electron imaging
• Dual beam charge neutralization
• Large area XPS
• Micro-area XPS
• Chemical state imaging with 128 data channels
• Sputter depth profiling
• Floating column argon ion gun
• Compucentric Zalar rotation
• Angle dependent XPS
• Five axis automated sample manipulator
• 25 mm and 60 mm diameter sample holders

 Optional Accessories

• 10 kV C₆₀ ion gun
• 20 kV C₆₀ ion gun
• 20 kV Ar₂₅₀₀⁺ gas cluster ion gun
• 100 nm Scanning AES
• UV light source for UPS
• Dual anode, achromatic x-ray source
• Sample transfer vessel
• Hot / Cold sample manipulator
• Custom sample preparation chambers