905-890-0555

PHI VersaProbe III Scanning XPS Microprobe

  • Scanned, micro-focused, monochromatic x-ray beam
  • X-ray beam induced secondary electron imaging
  • Dual beam charge neutralization
  • Large area XPS
  • Micro-area XPS
  • Chemical state imaging with 128 data channels
  • Sputter depth profiling
  • Floating column argon ion gun
  • Compucentric Zalar rotation
  • Angle dependent XPS
  • Five axis automated sample manipulator
  • 25 mm and 60 mm diameter sample holders

 

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Description

Announcing the latest in PHI’s line of scanning XPS microprobe instruments – the VersaProbe III. This multi-technique instrument builds on our industry-leading patented scanning microprobe technology and dual beam charge neutralization and takes it to a higher level. PHI VersaProbe III Scanning XPS Microprobe

Features of the VersaProbe III:

  • New Analyzer input lens with 2-3 times higher sensitivity for all analysis conditions
  • New Multi-channel detector for faster elemental and chemical imaging
  • New Angle dependent technology for +/- 5 degree solid angle collection for ADXPS measurements
  • Improved Hot/cold stage providing temperatures of -140° C to +600° C
  • New Dedicated hot sample platen operating up to 800° C
  • New 4-contact transferable sample mount for in-situ controlled potential experiments
  • New UPS design for increased sensitivity and improved energy resolution
  • Improved Auger performance providing higher energy resolution and better signal to noise
  • Micro-Focused Scanning X-ray Source
  • Large Area Spectroscopy
  • Micro Area Spectroscopy
  • Sputter Depth Profiling
  • Multi-Technique Test Chamber
  • SmartSoft-VersaProbe
  • MultiPak Data Reduction Software
  • Features & Accessories

 

 

 

 

Micro-Focused Scanning X-ray Source

 Micro-Focused Scanning X-Ray Source The core technology of the VersaProbe III is PHI’s patented, monochromatic, micro-focused, scanning x-ray source which provides excellent large area and superior micro-area spectroscopy performance. Spectroscopy, depth profiling and imaging can all be performed over the full range of x-ray beam sizes including the minimum x-ray beam size of less than 10 µm. Unique features this technology provides include:

  • Micro-focused, raster scanned x-ray beam
  • X-ray beam induced secondary electron imaging
  • XPS images with spectra at each pixel for retrospective chemical analysis
  • Point or multi-point spectroscopy
  • Point or multi-point thin film analysis

 

Large Area Spectroscopy

Turnkey Auto Analysis

  • Point and click analysis area definition
  • Robust Auto-Z sample alignment at all spot sizes
  • No-tune dual beam charge neutralization
  • Move without concern from insulator to conductor in auto analysis sequences

 

 

 

 

 

 Photograph of 60 mm diamter sample platen

Fully Automated Unattended Analysis

 Solder Bump Analysis  Steep Coupon Analysis  Solar Cell Analysis  Powder Sample Analysis

Micro Area Spectroscopy

Superior Micro Area Performance

  • Point and click analysis area definition
  • Robust Auto-Z sample alignment
  • No-tune dual beam charge neutralization
  • Move without concern from insulator to conductor in auto analysis sequences

 

 

 

 

 

 

 

 

 

 

 

 

 SXI Image of PMMA Micro Sphere

 

 

 

 

Micro Sphere Analysis

 

 Micro Sphere Analysis

 

 Micro Sphere Analysis

 

Sputter Depth Profiling

Optimized Configuration

  • Micro-focused x-ray beam
  • High sensitivity spectrometer
  • High performance floating column argon ion gun
  • Turnkey dual beam charge neutralization
  • Compucentric Zalar Rotation™
  • Micro-area sputter depth profiling
  • Multi-point sputter depth profiling

Inorganic Sputter Depth Profiling

  • High performance 0-5 keV Ar+ion gun
  • Low voltage floating column for ultra thin film sputter depth profiling
  • Bend in ion column to stop neutrals

 

 

 

 

 

Organic Sputter Depth Profiling

  • Optional 10 and 20 kV C60ion guns
  • Optional 20 kV Ar2500+gas cluster ion gun
  • Mass filtered cluster ion sources
  • Bend in ion column to stop neutrals

 

 

 

 

 

 

 Sputter Depth Profile

2 keV sputter depth profile of a multi-layer PVD TiC/C coating on silicon performed using Zalar rotation to enhance layer definition.

 

 

 

 

Sputter Depth Profile

2 keV sputter depth profile of a multi-layer coating on a computer hard disk performed using Zalar rotation to enhance layer definition.

 

10 kV C60+ sputter depth profile of 3 nm Irganox 3114 layers in an Irganox 3110 film.

20 kV Ar2500+ sputter depth profile of a 10 µm thick multilayer polymer film showing expected composition and layer definition.

SmartSoft-VersaProbe

 SmartSoft

Whether you are a casual user or an expert, the work flow driven UI and enhanced feature set will increase your productivity.

  • Intuitive single window user interface
  • Session tabs guide you through the analysis process
  • Integrated sample platen management
  • Point and click analysis area definition on saved images
  • User friendly queuing of multiple analysis tasks
  • Multi-point analysis and sputter depth profiling within an imaged area
  • Fully integrated control of optional accessories

 

 

 SmartSoft-VersaProbe Intuitive Single Window User Interface

MultiPak Data Reduction Software

 Data Reduction for XPS and AES

PHI MultiPak is the most comprehensive data reduction and interpretation software package available for electron spectroscopy. The tasks of spectral peak identification, extracting chemical state information, quantification, and detection limit enhancement are addressed with an array of powerful and easy-to-use software tools for spectra, line scans, images and sputter depth profiles. MultiPak can be used on the instrument PC to process data in real time or on an off line PC for report generation.

Advanced Data Reduction Tools

  • Auto peak identification
  • XPS chemical state database
  • XPS spectral deconvolution
  • Quantitative analysis
  • Non-linear least squares fitting
  • Linear least squares fitting
  • Target factor analysis
  • Retrospective chemical imaging
  • Batch mode data processing

 

 

 

 

 Multipak Data Reduction Software

Features & Accessories

 Standard Features

  • Scanned, micro-focused, monochromatic x-ray beam
  • X-ray beam induced secondary electron imaging
  • Dual beam charge neutralization
  • Large area XPS
  • Micro-area XPS
  • Chemical state imaging with 128 data channels
  • Sputter depth profiling
  • Floating column argon ion gun
  • Compucentric Zalar rotation
  • Angle dependent XPS
  • Five axis automated sample manipulator
  • 25 mm and 60 mm diameter sample holders

 Optional Accessories

  • 10 kV C60 ion gun
  • 20 kV C60 ion gun
  • 20 kV Ar2500+ gas cluster ion gun
  • 100 nm Scanning AES
  • UV light source for UPS
  • Dual anode, achromatic x-ray source
  • Sample transfer vessel
  • Hot / Cold sample manipulator
  • Custom sample preparation chambers

 

Download Data Sheet

Contact Spectra Research

Address

3585 Laird Rd., Unit 15 & 16,
L5L 5Z8 Mississauga
Ontario
Canada

Phone :  905-890-0555

Toll Free : 1-866-753-4433
Fax :  905-890-1959

About Spectra Research

Spectra Research Corporation (SRC) offers a range of innovative high-quality scientific products and laboratory services to industrial and scientific markets throughout Canada.

Established in 1993, SRC is a subsidiary of Allan Crawford Associates (ACA), one of Canada’s largest distributors of electronic components, test equipment and integrated networking solutions.

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