905-890-0555

DWL 66+ laser lithography system

  • Substrates up to 200 x 200 mm²
  • Structures down to 0.6 µm
  • Address grid down to 10 nm
  • Multiple write modes
  • Vector and Raster exposure mode
  • Multiple data input formats
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Description

chamber Multiple data input
Substrates up to 9“ x 9“
Structures down to 0.6 µm
Address grid down to 10 nm
Advanced gray scale exposure mode
Real time auto focus system
Customer specific laser source
Vector and raster exposure mode
Exchangeable write modes Camera
system for metrology and alignment
Front to backside alignment
Climate chamber
Multiple data input

 

 

The Ultimate Lithography Research Tool

The DWL 66+ laser lithography system is an economical, high resolution pattern generator for low volume mask making and direct writing. The capabilities and flexibility of this system make it the ultimate lithographic research tool in Life ScienceAdvanced PackagingMEMSMicro-OpticsSemiconductor and all other applications that require microstructures. The customer base of the DWL 66 systems include over 200 leading universities and research facilities world wide. Many of the system features have been developed in close cooperation with these institutions.

The basic DWL 66+ includes all the features that are needed for successful creation and analysis of your microstructures. It can be used for mask making or direct exposure on basically any flat material coated with photoresist. Numerous optional features increase the flexibility and make the system suitable for more applications. And if one of your applications requires a special technology, it can most likely be implemented in the DWL 66+.

Structure: Roll<br/>Resist: MR-X

Courtesy Dr. Joachim Schulz, KIT

Structure: Fresnel Lens<br/>Resist: AZ4562<br/>Thickness: 10 µm

 

Structure: Spiral<br/>Resist: MR-X<br/>Thickness: 70 µm

Courtesy Dr. Joachim Schulz (IMT), KIT

Structure: Multi-layer network<br/>Resist: SU-8<br/>Thickness: 15 µm and 2 µm

 

 

files/heidelberg/layout/icon_download_03 NEW.png

Key Features

  • Substrates up to 200 x 200 mm²
  • Structures down to 0.6 µm
  • Address grid down to 10 nm
  • Multiple write modes
  • Vector and Raster exposure mode
  • Multiple data input formats
  • Back side alignment
  • Climate chamber
  • Customer specific laser
  • Optical and air-gauge auto focus
  • Scripting capability
  • 3D exposure mode
  • Camera system for alignment

 

RELATED PRODUCT

Deep UV Lithography Systems

Deep UV Lithography Systems

Deep UV lithography systems with a 244 nm laser source, which can expose these resists and write isolated structures down to 200 nm and lines and spaces with a period of 500 nm. Other DUV light sources are available on demand.

 

Contact Spectra Research

Address

3585 Laird Rd., Unit 15 & 16,
L5L 5Z8 Mississauga
Ontario
Canada

Phone :  905-890-0555

Toll Free : 1-866-753-4433
Fax :  905-890-1959

About Spectra Research

Spectra Research Corporation (SRC) offers a range of innovative high-quality scientific products and laboratory services to industrial and scientific markets throughout Canada.

Established in 1993, SRC is a subsidiary of Allan Crawford Associates (ACA), one of Canada’s largest distributors of electronic components, test equipment and integrated networking solutions.

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