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Deep UV Lithography Systems

Deep UV lithography systems with a 244 nm laser source, which can expose these resists and write isolated structures down to 200 nm and lines and spaces with a period of 500 nm. Other DUV light sources are available on demand.

 

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Description

The laser sources in our standard systems range from 355 nm to 532 nm, making it possible to expose all the standard UV photo resists. However, for special applications resists sensitive at even shorter wavelengths are required. At the same time it is possible to create even smaller features because of the smaller wavelength. That is why we developed and installed deep UV lithography systems with a 244 nm laser source, which can expose these resists and write isolated structures down to 200 nm and lines and spaces with a period of 500 nm. Other DUV light sources are available on demand.

 

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Tabletop Micro Pattern Generator

Key Features and Options

Substrates up to 6“ x 6“
Structures down to 0.6 μm
Address grid down to 20 nm
Basic gray scale exposure mode
Real time auto focus system
Standard or UV diode laser source
Vector and raster exposure mode
Exchangeable write modes
Camera system for alignment
Multiple data input formats

Semiconductor

Photolithography is a standard process step in semiconductor device fabrication. Heidelberg Instruments Maskless Lithography tools cover a wide range of lithography applications in the Front-End-Of-Line as well as in the Back-End-Of-Line semiconductor production. Direct patterning of wafers can be performed by all systems from the product lineup. The tools offer advanced alignment capabilities to build […]

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Freeform Systems

  • Applications for implementation of electronic systems
  • Non-planar surfaces
  • Imaging sensors
  • Artificial vision
  • Integrated micro-optics

 

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Lithography Systems for special substrates

Lithography systems can accommodate substrates of arbitrary shapes with lateral dimensions of up to 1400 x 1400 mm2

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Freeform Systems

  • Applications for implementation of electronic systems
  • Non-planar surfaces
  • Imaging sensors
  • Artificial vision
  • Integrated micro-optics

MEMS

MEMS is an acronym for Micro-Electro-Mechanical Systems but is also referred to as micromachines (in Japan), or micro systems technology – mst (in Europe). The micro system components have dimensions in a range of 1 µm to 100 µm, while the complete devices have sizes up to a few millimeters. MEMS allow the miniaturization of […]

Contact Spectra Research

Address

3585 Laird Rd., Unit 15 & 16,
L5L 5Z8 Mississauga
Ontario
Canada

Phone :  905-890-0555

Toll Free : 1-866-753-4433
Fax :  905-890-1959

Email: info@spectraresearch.com

About Spectra Research

Spectra Research Corporation (SRC) offers a range of innovative high-quality scientific products and laboratory services to industrial and scientific markets throughout Canada.

Established in 1993, SRC is a subsidiary of Allan Crawford Associates (ACA), one of Canada’s largest distributors of electronic components, test equipment and integrated networking solutions.

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