Governmental Research

Features & Benefits

• Compact and robust design with high quality imaging. It is a convenient entry-level instrument for routine measurements, educational use and quality control.
• Theta Lite comes with OneAttension Software. The modern and user-friendly software reflects over 20 years of experience and close co-operation with our customers.  Its flexibility enables easy implementation of customized features and functionalities for special demands.
• Attension’s extensive service and application support team helps you get the best from your instrument. Pre-studies can be conducted in an AttensionLab to assess the feasibility of your research, test samples for verification, and to demonstrate the suitability of our tensiometers for your research.

Technical Specifications

BIO X is the new go-to 3d bioprinter for life science companies, researchers and innovators who work with bioprinting. Built to meet the needs of today’s bio-scientists, BIO X’s responsive Neocortex M1 internal computer coupled with HeartOS, the most powerful bioprinting operating system out there, allows the user to orchestrate the intricate process of building human tissues. BIO X is the most user friendly bioprinter on the market and a complete standalone product.

• Heated print heads
• Cooled print heads
• Heated print bed
• Cooled print bed
• Clean Chamber Technology
• Piston driven syringe head
• Pneumatic print heads
• Multi well plate printing
• Touch screen control

The INKREDIBLE Bioprinter has been optimized to print Skin and Cartilage tissue, however, the sky is the limit on what tissues you can print. The world is waiting to see what you will print next.

• Dual Printheads
• Clean Chamber Technology
• UV-crosslinking system
  

• Compact and robust atomic force microscope for stand alone and large stage operation
• Easy and quick cantilever exchange and alignment reduces downtime
• Automated batch measurements and scripting interface for system integration

• Mounts on virtually every upright optical microscope or 3D optical profilometer
• Integrated motor for automated cantilever approach and engage
• Standard and extended AFM modes available through a modular controller
  

The MLA150 has been specifically designed for easy operation and includes all our know-how on developing maskless lithography systems that we have gathered in the past 30 years. It offers all the capabilities that are required for single layer and multi-layer applications and because the MLA150 exposures are always non-contact it will even overcome some of the limitations of photomask based exposure technologies.

• Atomic resolution in minutes
• Extremely simple handling and reliable operation
• Controller and scan head integrated into a single device: just connect USB and power
• Starting at less than $10,000 USD

• Compact and robust atomic force microscope for stand alone and large stage operation
• Easy and quick cantilever exchange and alignment reduces downtime
• Automated batch measurements and scripting interface for system integration

The MLA100 is the perfect lithography solution for many R&D applications. The optical system is designed to write structures down to 1 μm at a speed of 50 mm²/min directly into photoresist, without the need for a photomask. The elimination of photomasks from the lithographic process will increase the flexibility and significantly shorten the prototyping or manufacturing cycle.

Features & Benefits

• Integrated method enabling to define contact angle and surface roughness accurately from the same location and to combine both surface chemical and topographical data with automated software calculations.
• Offers fast surface characterization method, which does not demand specialist to run the samples.
• Versatile roughness measurement: both 2D and 3D characterization..

Theta Topography Module

Theta Range Brochure

Lithography systems can accommodate substrates of arbitrary shapes with lateral dimensions of up to 1400 x 1400 mm²

Deep UV lithography systems with a 244 nm laser source, which can expose these resists and write isolated structures down to 200 nm and lines and spaces with a period of 500 nm. Other DUV light sources are available on demand.