SwissLitho AG NanoFrazor

 Rocks the Competition

DLS laser extension goes beta

Nanofabrication of high-quality devices on two-dimensional materials presents daunting challenges. Spectra Research Corporation is pleased to highlight, however, advances made by SRC supplier SwissLitho that have mitigated the challenges. As recently demonstrated by SwissLitho customers, and as reported in respected publications, 2D nanodevices made with NanoFrazor lithography significantly outperform devices made with electron beam technology, their main competition. This heralds a change in 2D nanodevice fabrication.

Breakthrough single-layer MoS2 nanodevices: Fabricating single-layer MoS2 and WSe2 transistors with NanoFrazor lithography

Dr. Xiaorui Zheng from Prof. Elisa Riedo’s lab at the New York University and their collaborators have demonstrated single-layer MoS2 and WSe2 transistors showing highly linear I-V curves, low contact resistance with vanishingly low Schottky barriers, and exceptionally high on-off ratios.  A paper published in Nature Electronics describes how to use NonaoFrazor to fabricate such high-quality devices. The key advantage of using thermal probe lithography as compared to electron beam lithography (EBL) is avoiding contamination from resist residues and simple and precise patterning of the contacts and the top gate thanks to the in-situ imaging capability. With this clear proof of superior device performance with even less effort, it’s expected that the NanoFrazor will replace EBL as the state-of-art method for making devices with this class of promising and sensitive materials.

Fabricating single-layer MoS2 and WSe2 transistors

Left: 1L-MoS2 dual-gate device with the top gate fabricated on top of a hBN flake as a gate insulator; Right: 1L-MoS2 Hall bar

The NanoFrazor Explore grows more muscle for nanofabrication and rapid prototyping

 The new DLS (Direct Laser Sublimation) system SwissLitho developed with Heidelberg Instruments is now ready for integration into NanoFrazor Explore systems. A few facilities such as Harvard’s CNS and FZ Jülich HNF will start beta-testing of this integrated mix & match extension this spring.

SwissLitho is excited about this because the focused laser of the DLS extension evaporates the resist just like the NanoFrazor tip does, but on larger scale. This means that with the DLS extension, you can pattern features such as contact wires and pads much faster than using the ultra-sharp NanoFrazor tip.

This integrated extension uses the same platform and software for mix & match lithography. The laser writes directly into the same thermosensitive resist layer (evaporation, i.e. no wet development required), so the DLS-written microstructures can be directly imaged and perfectly aligned with the NanoFrazor-written nanostructures. The same pattern transfer processes like lift-off have to be applied only once for both the micro- and the nanofeatures.

NanoFrazor-written nanostructures

DLS Laser Writer module with a 405nm laser with 120mW power integrated in the NanoFrazor Explore

Contact an SRC representative to learn more about the SwissLitho product line.